Ion beam analysis of metal ion implanted surfaces
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Date
1993-05-17
Journal Title
Journal ISSN
Volume Title
Publisher
INSTN Institut national des sciences et techniques nucléaires
Abstract
Ion implantation is an established method for altering the surface properties of many materials. While a variety of analytical techniques are available for the characterisation of implanted surfaces, those based on particle accelerators such as Rutherford backscattering (RBS) and nuclear reaction analysis (NRA) provide some of the most useful and powerful for this purpose. Application of the latter techniques to metal ion implantation research at Ansto will be described with particular reference to specific examples from recent studies. Where possible, the information obtained from ion beam analysis will be compared with that derived from other techniques such as Energy Dispersive X-ray (EDX) and Auger spectroscopies.
Description
Physical copy held by ANSTO Library at DDC: 530.416/15
Keywords
Alpha particles, Alloys, Aluminium alloys, Carbon, Charged Particles, Chromium ions, Chemical analysis, Data, Helium 3 reactions, Ion implantation, Ion Scattering Analysis, Nuclear reaction analysis, Oxygen 16 target, Surface treatments, Titanium ions, Tungsten ions, Nuclear reactions, Numerical data
Citation
Evans, P. J., Chu, J. W., Dytlewski, N., Hoffman, A., & Johnson, E. P. (1993). Ion beam analysis of metal ion implanted surfaces. The ANTARES AMS Centre at the Lucas Heights Research Laboratories. Paper presented to the First French - Australian Workshop on the Applications of Ion beam Analysis, 17-21 May 1993, Saclay, (pp. 47-61). In Frontier, J. P., Trochon, J., & Trocellier, P. (1993). Proceedings of the first French - Australian workshop on the applications of ion beam analysis, 17-21 May 1993, Saclay. Saclay, France : INSTN Institut national des sciences et techniques nucléaires.