Characterisation of the deposition of n-octanohydroxamate on copper surfaces
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Date
2013-04-01
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The Electrochemical Society
Abstract
The interaction of the flotation reagent, n-octanohydroxamate, with a copper electrode was investigated using cyclic voltammetry, contact angles, surface-enhanced Raman scattering, neutron reflectometry and X-ray reflectometry. The data demonstrated that hydroxamate did not undergo underpotential chemisorption. A hydrophobic non-passivating multilayer of copper n-octanohydroximate formed in the CuII stability region that was more stable than the oxide formed in the absence of hydroxamate. In the CuI and Cu0 stability regions the interface contained more than 50% water and the hydroxamate moiety was present in the keto tautomeric form. © IOP Publishing
Description
Keywords
Flotation, Reagents, Copper, Electrodes, Raman spectroscopy, Neutron reflectors, Water, Chemisorption, Oxides
Citation
Parker, G. K., Holt, S. A., & Hope, G. A. (2013). Characterisation of the deposition of n-octanohydroxamate on copper surfaces. Paper presented to 222nd ECS Meeting/PRiME 2012, 7-12 October 2012, Honolulu, Hawaii, USA. In ECS Transactions, 50(52), 23. doi:10.1149/05052.0023ecst