Characterisation of the deposition of n-octanohydroxamate on copper surfaces

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dc.contributor.authorParker, GKen_AU
dc.contributor.authorHolt, SAen_AU
dc.contributor.authorHope, GAen_AU
dc.date.accessioned2025-05-09T05:07:02Zen_AU
dc.date.available2025-05-09T05:07:02Zen_AU
dc.date.issued2013-04-01en_AU
dc.date.statistics2025-05-09en_AU
dc.description.abstractThe interaction of the flotation reagent, n-octanohydroxamate, with a copper electrode was investigated using cyclic voltammetry, contact angles, surface-enhanced Raman scattering, neutron reflectometry and X-ray reflectometry. The data demonstrated that hydroxamate did not undergo underpotential chemisorption. A hydrophobic non-passivating multilayer of copper n-octanohydroximate formed in the CuII stability region that was more stable than the oxide formed in the absence of hydroxamate. In the CuI and Cu0 stability regions the interface contained more than 50% water and the hydroxamate moiety was present in the keto tautomeric form. © IOP Publishingen_AU
dc.identifier.citationParker, G. K., Holt, S. A., & Hope, G. A. (2013). Characterisation of the deposition of n-octanohydroxamate on copper surfaces. Paper presented to 222nd ECS Meeting/PRiME 2012, 7-12 October 2012, Honolulu, Hawaii, USA. In ECS Transactions, 50(52), 23. doi:10.1149/05052.0023ecsten_AU
dc.identifier.conferenceenddate2012-10-12en_AU
dc.identifier.conferencename222nd ECS Meeting/PRiME 2012en_AU
dc.identifier.conferenceplaceHonolulu, Hawaii, USAen_AU
dc.identifier.conferencestartdate2012-10-07en_AU
dc.identifier.editorsLenote, O. M., & Mustain, W. E.en_AU
dc.identifier.isbn9781607685395en_AU
dc.identifier.issn1938-5862en_AU
dc.identifier.issn1938-6737en_AU
dc.identifier.issue52en_AU
dc.identifier.journaltitleECS Transactionsen_AU
dc.identifier.pagination23-33en_AU
dc.identifier.urihttps://doi.org/10.1149/05052.0023ecsten_AU
dc.identifier.urihttps://apo.ansto.gov.au/handle/10238/16164en_AU
dc.identifier.volume50en_AU
dc.language.isoenen_AU
dc.publisherThe Electrochemical Societyen_AU
dc.subjectFlotationen_AU
dc.subjectReagentsen_AU
dc.subjectCopperen_AU
dc.subjectElectrodesen_AU
dc.subjectRaman spectroscopyen_AU
dc.subjectNeutron reflectorsen_AU
dc.subjectWateren_AU
dc.subjectChemisorptionen_AU
dc.subjectOxidesen_AU
dc.titleCharacterisation of the deposition of n-octanohydroxamate on copper surfacesen_AU
dc.typeConference Paperen_AU
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