Characterisation of arsenic doped HgCdTe grown by molecular beam epitaxy
dc.contributor.author | Tsen, GK | en_AU |
dc.contributor.author | Sewell, RH | en_AU |
dc.contributor.author | Atanacio, AJ | en_AU |
dc.contributor.author | Prince, KE | en_AU |
dc.contributor.author | Musca, CA | en_AU |
dc.contributor.author | Dell, JM | en_AU |
dc.contributor.author | Antoszewski, J | en_AU |
dc.contributor.author | Faraone, L | en_AU |
dc.date.accessioned | 2020-10-25T19:26:49Z | en_AU |
dc.date.available | 2020-10-25T19:26:49Z | en_AU |
dc.date.issued | 2006-12-06 | en_AU |
dc.date.statistics | 2020-10-22 | en_AU |
dc.description.abstract | Extrinsic p-type doping of Mercury Cadmium Tel-luride (HgCdTe) epilayers grown by Molecular Beam Epitaxy (MBE) was carried out with an arsenic (As) cracker cell. As-grown samples were characterised via Fourier Transform Infrared Transmission Spectrometry (FTIR), Secondary Ion Mass Spectrometry (SIMS) as well as variable field magneto-transport measurements coupled with the quantitative mobility spectrum analysis (QMSA) to study the Hall effect characteristics. Arsenic activation annealing of the samples were performed and magneto-transport measurements repeated. Results indicate that as-grown samples show n-type behaviour indicating that arsenic incorporate as donors in the material with annealed samples showing p-type characteristics with heavy compensation. © Copyright 2006 IEEE | en_AU |
dc.identifier.booktitle | Proceedings of the 2006 Conference on Optoelectronic and Microelectronic Materials and Devices : 6-8 December 2006, Perth, Australia | en_AU |
dc.identifier.citation | Tsen, G. K. O., Sewell, R., Atanacio, A. J., Prince, K. E., Musca, C. A., Dell, J. M., Antoszewski,J & Faraone, L. (2006, December). Characterisation of arsenic doped HgCdTe grown by molecular beam epitaxy. Paper presented to the 2006 Conference on Optoelectronic and Microelectronic Materials and Devices, 6-8 Dec, 2006, Perth, Western Australia. In 2006 Conference on Optoelectronic and Microelectronic Materials and Devicesm , Perth, WA, Australia, 2006, (pp. 55-58). IEEE. doi: 10.1109/COMMAD.2006.4429878 | en_AU |
dc.identifier.conferenceenddate | 8 December 2006 | en_AU |
dc.identifier.conferencename | 2006 Conference on Optoelectronic and Microelectronic Materials and Devices | en_AU |
dc.identifier.conferenceplace | Perth, Western Australia | en_AU |
dc.identifier.conferencestartdate | 6 December 2006 | en_AU |
dc.identifier.isbn | 978-1-4244-0577-0 | en_AU |
dc.identifier.pagination | 55-58 | en_AU |
dc.identifier.uri | https://ieeexplore.ieee.org/document/4429878 | en_AU |
dc.identifier.uri | https://apo.ansto.gov.au/dspace/handle/10238/9932 | en_AU |
dc.language.iso | en | en_AU |
dc.publisher | IEEE | en_AU |
dc.subject | Molecular beam epitaxy | en_AU |
dc.subject | Infrared spectra | en_AU |
dc.subject | Mass spectroscopy | en_AU |
dc.subject | Magnetic fields | en_AU |
dc.subject | Annealing | en_AU |
dc.subject | Cadmium | en_AU |
dc.subject | Fourier transformation | en_AU |
dc.subject | Couplings | en_AU |
dc.subject | Magnetic analyzers | en_AU |
dc.title | Characterisation of arsenic doped HgCdTe grown by molecular beam epitaxy | en_AU |
dc.type | Conference Paper | en_AU |
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