Analysis of nitrogen-implanted tin oxide films used in dye-sensitised solar cells
dc.contributor.author | Tesfamichael, T | en_AU |
dc.contributor.author | Will, G | en_AU |
dc.contributor.author | Kelly, IJ | en_AU |
dc.contributor.author | Bell, J | en_AU |
dc.date.accessioned | 2021-09-02T01:47:29Z | en_AU |
dc.date.available | 2021-09-02T01:47:29Z | en_AU |
dc.date.issued | 2003-02-03 | en_AU |
dc.date.statistics | 2021-08-23 | en_AU |
dc.description.abstract | Nitrogen was implanted in SnO2:F film using ion energies between 10 and 40 keV and ion dose range 1014 – 1016 cm-2. The microstructure of the film was modified by the ion implantation giving an amorphous region of various thicknesses. The amount of N was found to increase with increasing ion dose and energy. A maximum concentration of 5% N was measured in the highest ion dose and energy implanted sample. | en_AU |
dc.identifier.citation | Tesfamichael, T., Will, G., Kelly, I., & Bell, J. (2003). Analysis of nitrogen-implanted tin oxide films used in dye-sensitised solar cells. Paper presented to the "27th Annual Condensed Matters and Materials Meeting, Wagga, 2003", Charles Stuart University, Wagga, Wagga, NSW, Australia, 4th - 7th February 2003. Retrieved from: https://www.physics.org.au/wp-content/uploads/cmm/2003/WW03_05.pdf | en_AU |
dc.identifier.conferenceenddate | 7 February 2003 | en_AU |
dc.identifier.conferencename | 27th Annual Condensed Matters and Materials Meeting | en_AU |
dc.identifier.conferenceplace | Wagga Wagga, NSW | en_AU |
dc.identifier.conferencestartdate | 4 February 2003 | en_AU |
dc.identifier.issn | WW03_05 | en_AU |
dc.identifier.uri | https://www.physics.org.au/wp-content/uploads/cmm/2003/WW03_05.pdf | en_AU |
dc.identifier.uri | https://apo.ansto.gov.au/dspace/handle/10238/11575 | en_AU |
dc.language.iso | en | en_AU |
dc.publisher | Australian Institute of Physics | en_AU |
dc.subject | Nitrogen | en_AU |
dc.subject | Tin oxides | en_AU |
dc.subject | Solar cells | en_AU |
dc.subject | keV range | en_AU |
dc.subject | keV range 10-100 | en_AU |
dc.subject | Photoelectrochemical cells | en_AU |
dc.subject | Transmission electron microscopy | en_AU |
dc.title | Analysis of nitrogen-implanted tin oxide films used in dye-sensitised solar cells | en_AU |
dc.type | Conference Paper | en_AU |