dLow temperature of formation of nickel germanide by reaction of nickel and crystalline germanium

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dc.contributor.authorAlgahtani, Fen_AU
dc.contributor.authorLeech, PWen_AU
dc.contributor.authorReeves, GKen_AU
dc.contributor.authorHolland, ASen_AU
dc.contributor.authorBlackford, MGen_AU
dc.contributor.authorThorogood, GJen_AU
dc.contributor.authorMcCallum, JCen_AU
dc.contributor.authorJohnson, BCen_AU
dc.date.accessioned2025-01-23T04:29:03Zen_AU
dc.date.available2025-01-23T04:29:03Zen_AU
dc.date.issued2014-12en_AU
dc.date.statistics2025-01-20en_AU
dc.description.abstractThe formation of nickel germanide has been examined over a range of low temperatures (200-400 °C) in an attempt to minimize the thermal budget for the process. Cross-sectional Transmission Electron Microscopy (TEM) was used to determine the texture of the germanide layer and the morphology and constituent composition of the Ge/NiGe interface. The onset and completion of reaction between Ni and Ge were identified by means of a heated stage in combination with in-situ x-ray diffraction (XRD) measurements. The stages of reaction were also monitored using measurements of sheet resistance of the germanides by the Van der Pauw technique. The results have shown that the minimum temperature for the initiation of reaction of Ni and Ge to form NiGe was 225 °C. However, an annealing temperature > 275 °C was necessary for the extensive (and practical) formation of NiGe. Between 200 and 300 °C, the duration of annealing required for the formation of NiGe was significantly longer than at higher temperatures. The stoichiometry of the germanide was very close to NiGe (1:1) as determined using energy dispersive spectroscopy (EDS).en_AU
dc.identifier.booktitleMaterials Reserach Society Symposium Proceedings Volume 1655 Solid-State Chemistry of Inorganic Materials December 1-6, 2013 Boston, Massachusetts, USAen_AU
dc.identifier.citationAlgahtani, F., Leech, P. W., Reeves, G. K., Holland, A. S., Blackford, M., Thorogood, G., McCallum, J. C., & Johnson, B. C. (2014). dLow temperature of formation of nickel germanide by reaction of nickel and crystalline germanium. Paper presented to the Solid-State Chemistry of Inforganic Materials, December 1-6, 2013, Boston, Massachusetts, USA. In MRS Proceedings, 1655, 320. doi:org/10.1557/opl.2014.408en_AU
dc.identifier.conferenceenddate2013-12-06en_AU
dc.identifier.conferencenameSolid-State Chemistry of Inforganic Materialsen_AU
dc.identifier.conferenceplaceBoston, Massachusetts, USAen_AU
dc.identifier.conferencestartdate2013-12-01en_AU
dc.identifier.isbn9781510805217en_AU
dc.identifier.issn2731-5894en_AU
dc.identifier.issn1946-4274en_AU
dc.identifier.issueJanuaryen_AU
dc.identifier.journaltitleMRS Advancesen_AU
dc.identifier.pagination320en_AU
dc.identifier.urihttps://doi.org/10.1557/opl.2014.408en_AU
dc.identifier.urihttps://apo.ansto.gov.au/handle/10238/15950en_AU
dc.identifier.volume1655en_AU
dc.languageEnglishen_AU
dc.language.isoenen_AU
dc.publisherSpringer Natureen_AU
dc.relation.ispartofseriesMaterials Reserach Society Symposium Proceedings; 1655en_AU
dc.subjectTemperature rangeen_AU
dc.subjectNickelen_AU
dc.subjectGermanidesen_AU
dc.subjectThin Filmsen_AU
dc.subjectTransmission electron microscopyen_AU
dc.subjectOxygenen_AU
dc.subjectLayersen_AU
dc.subjectMorphologyen_AU
dc.titledLow temperature of formation of nickel germanide by reaction of nickel and crystalline germaniumen_AU
dc.typeConference Paperen_AU
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