Development and fabrication of cylindrical silicon-on-insulator microdosimeter arrays.

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dc.contributor.authorLai, NSen_AU
dc.contributor.authorLim, WHen_AU
dc.contributor.authorZiebell, ALen_AU
dc.contributor.authorReinhard, MIen_AU
dc.contributor.authorRosenfeld, ABen_AU
dc.contributor.authorDzurak, ASen_AU
dc.date.accessioned2010-04-06T23:29:42Zen_AU
dc.date.accessioned2010-04-30T05:09:13Zen_AU
dc.date.available2010-04-06T23:29:42Zen_AU
dc.date.available2010-04-30T05:09:13Zen_AU
dc.date.issued2009-06en_AU
dc.date.statistics2009-06en_AU
dc.description.abstractRecent developments in the fabrication and simulation of prototype silicon-on-insulator (SOI) microdosimeter arrays are presented. A new planar array design has been proposed which has a number of advantages over the previous elongated parallelepiped and cylindrical mesa array designs. This novel planar array design, which incorporates a guard ring, is based upon 2500 planar cylindrically shaped p-i-n detectors and was fabricated via dopant diffusion and ion implantation. The dopant-diffused arrays were successfully fabricated and tested using 2 mum and 10-mum- thick SOI substrates. Technology computer-aided design modeling of the ion-implanted structure is presented which includes the electrostatic potential profile, showing possible avalanche signal multiplication around the n+ core of the microdosimeter. The alpha particle charge transient response was simulated to determine the charge collection in the sensitive region. © 2009, Institute of Electrical and Electronics Engineers (IEEE)en_AU
dc.identifier.citationLai, N. S., Lim, W. H., Ziebell, A. L., Reinhard, M. I., Rosenfeld, A. B., & Dzurak, A. S. (2009). Development and fabrication of cylindrical silicon-on-insulator microdosimeter arrays. IEEE Transactions on Nuclear Science, 56(3), 1637-1641. doi:10.1109/TNS.2009.2015317en_AU
dc.identifier.govdoc1594en_AU
dc.identifier.issn0018-9499en_AU
dc.identifier.issue3en_AU
dc.identifier.journaltitleIEEE Transactions on Nuclear Scienceen_AU
dc.identifier.pagination1637-1641en_AU
dc.identifier.urihttp://dx.doi.org/10.1109/TNS.2009.2015317en_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/3069en_AU
dc.identifier.volume56en_AU
dc.language.isoenen_AU
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en_AU
dc.subjectTownsend dischargeen_AU
dc.subjectMicrodosimetryen_AU
dc.subjectSiliconen_AU
dc.subjectIon implantationen_AU
dc.subjectComputer-aided designen_AU
dc.subjectCylindrical configurationen_AU
dc.titleDevelopment and fabrication of cylindrical silicon-on-insulator microdosimeter arrays.en_AU
dc.typeJournal Articleen_AU
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