Nanocolumnar preferentially oriented PSZT thin films deposited on thermally grown silicon dioxide

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dc.contributor.authorSriram, Sen_AU
dc.contributor.authorBhaskaran, Men_AU
dc.contributor.authorMitchell, Aen_AU
dc.contributor.authorMitchell, DRGen_AU
dc.contributor.authorKostovski, Gen_AU
dc.date.accessioned2010-04-08T06:26:30Zen_AU
dc.date.accessioned2010-04-30T05:04:11Zen_AU
dc.date.available2010-04-08T06:26:30Zen_AU
dc.date.available2010-04-30T05:04:11Zen_AU
dc.date.issued2009-01en_AU
dc.date.statistics2009-01en_AU
dc.description.abstractWe report the first instance of deposition of preferentially oriented, nanocrystalline, and nanocolumnar strontium-doped lead zirconate titanate (PSZT) ferroelectric thin films directly on thermal silicon dioxide. No intermediate seed or activation layers were used between PSZT and silicon dioxide. The deposited thin films have been characterised using a combination of diffraction and microscopy techniques. © 2009, Springer.en_AU
dc.identifier.citationSriram, S., Bhaskaran, M., Mitchell, A., Mitchell, D. R. G., & Kostovski, G. (2009). Nanocolumnar preferentially oriented PSZT thin films deposited on thermally grown silicon dioxide. Nanoscale Research Letters, 4(1), 29-33. doi:10.1007/s11671-008-9197-2en_AU
dc.identifier.govdoc1270en_AU
dc.identifier.issn1931-7573en_AU
dc.identifier.issue1en_AU
dc.identifier.journaltitleNanoscale Research Lettersen_AU
dc.identifier.pagination29-33en_AU
dc.identifier.urihttp://dx.doi.org/10.1007/s11671-008-9197-2en_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/3117en_AU
dc.identifier.volume4en_AU
dc.language.isoenen_AU
dc.publisherSpringeren_AU
dc.subjectThin filmsen_AU
dc.subjectX-ray diffractionen_AU
dc.subjectMicroscopyen_AU
dc.subjectStrontiumen_AU
dc.subjectDoped materialsen_AU
dc.subjectPZTen_AU
dc.titleNanocolumnar preferentially oriented PSZT thin films deposited on thermally grown silicon dioxideen_AU
dc.typeJournal Articleen_AU
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