Nanocolumnar preferentially oriented PSZT thin films deposited on thermally grown silicon dioxide

Sriram, S; Bhaskaran, M; Mitchell, A; Mitchell, DRG; Kostovski, G

Nanocolumnar preferentially oriented PSZT thin films deposited on thermally grown silicon dioxide

Date

2009-01

Authors

Publisher

Springer

Abstract

We report the first instance of deposition of preferentially oriented, nanocrystalline, and nanocolumnar strontium-doped lead zirconate titanate (PSZT) ferroelectric thin films directly on thermal silicon dioxide. No intermediate seed or activation layers were used between PSZT and silicon dioxide. The deposited thin films have been characterised using a combination of diffraction and microscopy techniques. © 2009, Springer.

Keywords

Thin films, X-ray diffraction, Microscopy, Strontium, Doped materials, PZT

Citation

Sriram, S., Bhaskaran, M., Mitchell, A., Mitchell, D. R. G., & Kostovski, G. (2009). Nanocolumnar preferentially oriented PSZT thin films deposited on thermally grown silicon dioxide. Nanoscale Research Letters, 4(1), 29-33. doi:10.1007/s11671-008-9197-2