Electrochemical grafting of organic films on silica

Datson, Z; Dief, E; Li, T; Le Brun, AP; Darwish, N

Electrochemical grafting of organic films on silica

Date

2022-10-11

Authors

Publisher

Royal Society of Chemistry (RSC)

Abstract

Traditionally, self-assembled monolayers formed on silicon require the removal of the insulating and chemically inert silica layer that naturally forms on the surface of crystalline silicon. The removal of silica is thought to be necessary in order to expose the conducting Si–H surface, which is reactive towards molecules. Here we report the unexpected result of electrochemical formation of thin organic films on silica-terminated silicon with silica thickness up to 20 nm. The process is facilitated by the electrochemical generation of aryl radicals that react with silanol groups at the distal end of silica. © Royal Society of Chemistry 2024.

Keywords

Electrochemistry, Films, Silica, Organic matter, Silicon, Radicals, Molecules

Citation

Datson, Z., Dief, E., Li, T., Le Brun, A., & Darwish, N. (2022). Electrochemical grafting of organic films on silica [10.1039/D2CC03169H]. Chemical Communications, 58(81), 11378-11381. doi.org/10.1039/D2CC03169H