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Title: Characterization of thin films for X-ray and neutron waveguiding by X-ray reflectivity and atomic force microscopy
Authors: Pelliccia, D
Kandasamy, S
James, M
Keywords: Neutrons
Thin films
X-ray lasers
Wave propagation
Issue Date: 1-Nov-2013
Publisher: Wiley-VCH Verlag GMBH
Citation: Pelliccia, D., Kandasamy, S., & James, M. (2013). Characterization of thin films for x-ray and neutron waveguiding by x-ray reflectivity and atomic force microscopy. Physica Status Solidi A - Applications and Materials Science, 210(11), 2416-2422. doi:10.1002/pssa.201330113
Abstract: X-ray and neutron guiding in thin-film waveguides are finding numerous applications, such as sub-micron beam production for X-ray microscopy, and applications in neutron interferometric devices and polarizers. Thin-film waveguides are composed of a three-layer stack where the central layer, displaying low absorption for X-rays/neutrons, act as a guiding film. The utilization of such systems with low brilliance X-rays and neutron sources, requires the thickness of the guiding film to be increased. The efficiency of the waveguides critically depends on the thickness of the guiding layer and its surface roughness. In this paper we address the problem of producing relatively thick and smooth guiding layers for a high efficiency, thin-film neutron waveguide. We have produced a Ni/Al/Ni tri-layer structure with a 500 nm thick Al layer optimized for neutron waveguiding. The characterization is performed by complementary X-ray reflectometry and atomic force microscopy. The surface roughness estimation by mean of the two methods is presented and discussed. We show that a combination of sputtering/evaporation processes is beneficial in reducing the roughness of the Al film. © 2013, Wiley-VCH Verlag GmbH & Co. KGaA
Gov't Doc #: 5405
ISSN: 1862-6300
Appears in Collections:Journal Articles

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