Characterization of thin films for X-ray and neutron waveguiding by x-ray reflectivity and atomic force microscopy

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dc.contributor.authorPelliccia, Den_AU
dc.contributor.authorKandasamy, Sen_AU
dc.contributor.authorJames, Men_AU
dc.date.accessioned2014-06-06T01:37:30Zen_AU
dc.date.available2014-06-06T01:37:30Zen_AU
dc.date.issued2013-11-01en_AU
dc.date.statistics2014-06-06en_AU
dc.description.abstractX-ray and neutron guiding in thin-film waveguides are finding numerous applications, such as sub-micron beam production for X-ray microscopy, and applications in neutron interferometric devices and polarizers. Thin-film waveguides are composed of a three-layer stack where the central layer, displaying low absorption for X-rays/neutrons, act as a guiding film. The utilization of such systems with low brilliance X-rays and neutron sources, requires the thickness of the guiding film to be increased. The efficiency of the waveguides critically depends on the thickness of the guiding layer and its surface roughness. In this paper we address the problem of producing relatively thick and smooth guiding layers for a high efficiency, thin-film neutron waveguide. We have produced a Ni/Al/Ni tri-layer structure with a 500 nm thick Al layer optimized for neutron waveguiding. The characterization is performed by complementary X-ray reflectometry and atomic force microscopy. The surface roughness estimation by mean of the two methods is presented and discussed. We show that a combination of sputtering/evaporation processes is beneficial in reducing the roughness of the Al film. © 2013, Wiley-VCH Verlag GmbH & Co. KGaAen_AU
dc.identifier.citationPelliccia, D., Kandasamy, S., & James, M. (2013). Characterization of thin films for x-ray and neutron waveguiding by x-ray reflectivity and atomic force microscopy. physica status solidi a: applications and materials science, 210(11), 2416-2422. doi:10.1002/pssa.201330113en_AU
dc.identifier.govdoc5405en_AU
dc.identifier.issn1862-6300en_AU
dc.identifier.issue11en_AU
dc.identifier.journaltitlephysica status solidi a: applications and materials scienceen_AU
dc.identifier.pagination2416-2422en_AU
dc.identifier.urihttp://dx.doi.org/10.1002/pssa.201330113en_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/5680en_AU
dc.identifier.volume210en_AU
dc.language.isoenen_AU
dc.publisherWiley-VCH Verlag GMBHen_AU
dc.subjectNeutronsen_AU
dc.subjectThin filmsen_AU
dc.subjectX-ray lasersen_AU
dc.subjectWaveguidesen_AU
dc.subjectWave propagationen_AU
dc.subjectMicroscopyen_AU
dc.titleCharacterization of thin films for X-ray and neutron waveguiding by x-ray reflectivity and atomic force microscopyen_AU
dc.typeJournal Articleen_AU
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