TEM of atomic layer deposition TiO2

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dc.contributor.authorMitchell, DRGen_AU
dc.contributor.authorAttard, DJen_AU
dc.contributor.authorTriani, Gen_AU
dc.date.accessioned2023-10-06T04:54:19Zen_AU
dc.date.available2023-10-06T04:54:19Zen_AU
dc.date.issued2002-02-04en_AU
dc.date.statistics2023-09-11en_AU
dc.description.abstractSince the development of the atomic layer deposition (ALD) technique in the 1970s it has been widely used for the deposition of a range of binary, ternary and quaternary thin film systems (Niinisto 1996). The distinguishing feature of ALD is that the surface reactions are self limiting. Precursors saturate the adsorption sites, excess precursor is purged, followed by a pulse of reactant to form the film in-situ. Repetition of this deposition cycle permits films to be deposited to the desired thickness. Since the process is driven by adsorption, it produces films with outstanding conformality with the substrate (Ritala and Leskela, 1999), albeit at the expense of very slow deposition rates ( 50nm/hour). Following the recent commissioning of an ALD deposition system, we have been developing our expertise in the deposition and characterisation of TiO2 films in the first instance. These have potential uses in applications such as optical coatings, photovoltaics, sensors and catalysts. The focus of this paper is to report our plan view and cross-sectional transmission electron microscopy (TEM) studies on these films. Despite the power of the TEM technique, it has enjoyed very limited application to the study of any ALD films to date. Our results describe a detailed picture of the evolution of the film morphology under the influence of deposition temperature and surface chemistry of the substrate. These factors influence the nucleation of crystallisation within the films. Plasmon imaging, energy filtered imaging and electron energy loss spectroscopy enable the films to be characterised at the nanometer scale. ©2002 Australian Society for Electron Microscopy Incen_AU
dc.identifier.booktitleACEM17: 17th Australian Conference on Electron Microscopy, Monday 4th - Friday 8th February 2002, Adelaide Convention Centre, Adelaide, South Australia : program and abstract booken_AU
dc.identifier.citationMitchell, D. R. G., Attard, D. J., & Triani, G. (2002). TEM of atomic layer deposition TiO2. Presentation to the ACEM17: 17th Australian Conference on Electron Microscopy, Adelaide, South Australia, Monday 4th - Friday 8th February 2002. In J. Terlet & M. Dayman, (Eds), ACEM17: 17th Australian Conference on Electron Microscopy, Monday 4th - Friday 8th February 2002, Adelaide Convention Centre, Adelaide, South Australia : program and abstract book , (p. 86). Adelaide: Australian Society for Electron Microscopy .en_AU
dc.identifier.conferenceenddate2002-02-08en_AU
dc.identifier.conferencenameACEM17: 17th Australian Conference on Electron Microscopyen_AU
dc.identifier.conferenceplaceAdelaide, South Australiaen_AU
dc.identifier.conferencestartdate2002-02-04en_AU
dc.identifier.editorsJ. Terlet & M. Daymanen_AU
dc.identifier.isbn095804080xen_AU
dc.identifier.pagination86en_AU
dc.identifier.placeofpublicationAdelaide, South Australiaen_AU
dc.identifier.urihttps://apo.ansto.gov.au/handle/10238/15146en_AU
dc.language.isoenen_AU
dc.publisherAustralian Society for Electron Microscopyen_AU
dc.subjectCrystallizationen_AU
dc.subjectEnergy-loss spectroscopyen_AU
dc.subjectNucleationen_AU
dc.subjectStructural chemical analysisen_AU
dc.subjectSurface coatingen_AU
dc.subjectTemperature dependenceen_AU
dc.subjectThin Filmsen_AU
dc.subjectTitanium oxidesen_AU
dc.subjectTransmission electron microscopyen_AU
dc.titleTEM of atomic layer deposition TiO2en_AU
dc.typeConference Abstracten_AU
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