Influence of Si(100) surface pretreatment on the morphology of TiO2 films grown by atomic layer deposition

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dc.contributor.authorFinnie, KSen_AU
dc.contributor.authorTriani, Gen_AU
dc.contributor.authorShort, KTen_AU
dc.contributor.authorMitchell, DRGen_AU
dc.contributor.authorAttard, DJen_AU
dc.contributor.authorBartlett, JRen_AU
dc.contributor.authorBarbé, CJen_AU
dc.date.accessioned2025-12-18T06:06:17Zen_AU
dc.date.available2025-12-18T06:06:17Zen_AU
dc.date.issued2003-06-27en_AU
dc.date.statistics2025-12-03en_AU
dc.description.abstractThe effect of water plasma treatment of both hydrophobic and hydrophilic Si(1 0 0) surfaces has been studied using infrared spectroscopy to monitor the various surface species present. Exposure to a water plasma results in a significant increase in the concentration of H-bonded hydroxyls and hydrides. Both atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (XTEM) of TiO2 films deposited by atomic layer deposition at 300 °C, show that the morphology of the films is dependent on the nature of the initial surface. XTEM of the early stages of growth showed that coatings on hydrophilic substrates deposited as initially amorphous and continuous films, which crystallised with further growth. However, the hydrophobic substrate produced island growth of small, crystalline grains. AFM images of 23-nm thick films showed that films deposited on hydrophobic and hydrophilic Si consisted of 35-100 and 150-350 nm crystallites, respectively. A film on water plasma treated Si, closely resembled that on the hydrophilic surface, indicating that hydroxyl groups are responsible for directing the film growth. © 2003 Elsevier Science B.V.en_AU
dc.identifier.citationFinnie, K. S., Triani, G., Short, K. T., Mitchell, D. R. G., Attard, D. J., Bartlett, J. R., & Barbé, C. J. (2003). Influence of Si(100) surface pretreatment on the morphology of TiO2 films grown by atomic layer deposition. Thin Solid Films, 440(1), 109–116. doi:10.1016/S0040-6090(03)00818-6en_AU
dc.identifier.issn0040-6090en_AU
dc.identifier.issue1-2en_AU
dc.identifier.journaltitleThin Solid Filmsen_AU
dc.identifier.pagination109-116en_AU
dc.identifier.urihttps://doi.org/10.1016/s0040-6090(03)00818-6en_AU
dc.identifier.urihttps://apo.ansto.gov.au/handle/10238/16805en_AU
dc.identifier.volume440en_AU
dc.languageEnglishen_AU
dc.language.isoenen_AU
dc.publisherElsevieren_AU
dc.subjectSiliconen_AU
dc.subjectFilmsen_AU
dc.subjectMorphologyen_AU
dc.subjectTitaniumen_AU
dc.subjectPlasmaen_AU
dc.subjectAtomic force microscopyen_AU
dc.subjectWateren_AU
dc.subjectHydridesen_AU
dc.subjectPlasmaen_AU
dc.subjectSpectroscopyen_AU
dc.titleInfluence of Si(100) surface pretreatment on the morphology of TiO2 films grown by atomic layer depositionen_AU
dc.typeJournal Articleen_AU
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