Chemically induced electric field: flat band potential engineering

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dc.contributor.authorBak, Ten_AU
dc.contributor.authorGuo, Zen_AU
dc.contributor.authorLi, Wen_AU
dc.contributor.authorAtanacio, AJen_AU
dc.contributor.authorNowotny, Jen_AU
dc.date.accessioned2020-12-20T19:04:09Zen_AU
dc.date.available2020-12-20T19:04:09Zen_AU
dc.date.issued2012-10-05en_AU
dc.date.statistics2020-12-18en_AU
dc.description.abstractThe present work considers engineering of the flat band potential, FBP, of metal oxides in a controlled manner. The aim is to minimise the energy losses related to recombination. The related experimental approaches include imposition of a chemically-induced electric field using the phenomena of segregation, diffusion and the formation of multilayer systems. This paper considers several basic phenomena that allow the modification of the surface charge and the space charge at the gas/solid and solid/liquid interfaces. © (2012) Society of Photo-Optical Instrumentation Engineers (SPIE).en_AU
dc.identifier.booktitleSPIE Solar Energy & Technology: Solar Hydrogen and Nanotechnology VIIen_AU
dc.identifier.citationBak, T., Guo, Z., Li, W., Atanacio, A. J., & Nowotny, J. (2012). Chemically induced electric field: flat band potential engineering. In: Vayssieres, L. (ed), SPIE Solar Energy & Technology: Solar Hydrogen and Nanotechnology VII, 12-16 August, 2012, San Diego, California. (Vol. 8469, pp. 84690Q). Society of Photo-Optical Instrumentation Engineers (SPIE). doi:10.1117/12.927749en_AU
dc.identifier.conferenceenddate16 August 2012en_AU
dc.identifier.conferencenameSPIE Optics and Photonics 2012en_AU
dc.identifier.conferenceplaceSan Diego, Californiaen_AU
dc.identifier.conferencestartdate12 August 2012en_AU
dc.identifier.editorsVayssieres, L.en_AU
dc.identifier.isbn9780819491886en_AU
dc.identifier.issue5en_AU
dc.identifier.pagination84690Qen_AU
dc.identifier.urihttps://doi.org/10.1117/12.927749en_AU
dc.identifier.urihttps://apo.ansto.gov.au/dspace/handle/10238/10130en_AU
dc.identifier.volume8469en_AU
dc.language.isoenen_AU
dc.publisherSPIEen_AU
dc.subjectInterfacesen_AU
dc.subjectDiffusionen_AU
dc.subjectOxidesen_AU
dc.subjectOxygenen_AU
dc.subjectSolar energyen_AU
dc.subjectN-type conductorsen_AU
dc.subjectElectronsen_AU
dc.subjectIonizationen_AU
dc.subjectMetalsen_AU
dc.titleChemically induced electric field: flat band potential engineeringen_AU
dc.typeConference Paperen_AU
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