Radiation hardness of n-type SiC Schottky barrier diodes irradiated with MeV He ion microbeam
dc.contributor.author | Pastuovic, Z | en_AU |
dc.contributor.author | Capan, I | en_AU |
dc.contributor.author | Cohen, DD | en_AU |
dc.contributor.author | Forneris, J | en_AU |
dc.contributor.author | Iwamoto, N | en_AU |
dc.contributor.author | Ohshima, T | en_AU |
dc.contributor.author | Siegele, R | en_AU |
dc.contributor.author | Hoshino, N | en_AU |
dc.contributor.author | Tsuchida, H | en_AU |
dc.date.accessioned | 2015-09-01T02:52:53Z | en_AU |
dc.date.available | 2015-09-01T02:52:53Z | en_AU |
dc.date.issued | 2015-04-01 | en_AU |
dc.description.abstract | We studied the radiation hardness of 4H-SiC Schottky barrier diodes (SBD) for the light ion detection and spectroscopy in harsh radiation environments. n-Type SBD prepared on nitrogen-doped (similar to 4 x 10(14) cm(-3)) epitaxial grown 4H-SiC thin wafers have been irradiated by a raster scanning alpha particle microbeam (2 and 4 MeV He2+ ions separately) in order to create patterned damage structures at different depths within a sensitive volume of tested diodes. Deep Level Transient Spectroscopy (DLTS) analysis revealed the formation of two deep electron traps in the irradiated and not thermally treated 4H-SiC within the ion implantation range (E1 and E2). The E2 state resembles the well-known Z(1/2) center, while the E1 state could not be assigned to any particular defect reported in the literature. Ion Beam Induced Charge (IBIC) microscopy with multiple He ion probe microbeams (1-6 MeV) having different penetration depths in tested partly damaged 4H-SiC SBD has been used to determine the degradation of the charge collection efficiency (CCE) over a wide fluence range of damaging alpha particle. A non-linear behavior of the CCE decrease and a significant degradation of the spectroscopic performance with increasing He ion fluence were observed above the value of 10(11) cm(-2). © 2015 Published by Elsevier B.V. | en_AU |
dc.identifier.citation | Pastuovic, Z., Capan, I., Cohen, D. D., Forneris, J., Iwamoto, N., Ohshima, T., Siegele, R., Hoshino, N., & Tsuchida, H. (2015). Radiation hardness of n-type SiC Schottky barrier diodes irradiated with MeV He ion microbeam. Paper presented to the 14th International Conference on Nuclear Microprobe Technology & Applications, 6-11 July 2014, Palazzo del Bo and Centro Culturale San Gaetano, Padova, Italy. In Butz, T., Reinert, T., & Spemann, D. (Eds), Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 348, 233-239. doi:10.1016/j.nimb.2014.12.064 | en_AU |
dc.identifier.conferenceenddate | 11 July 2014 | en_AU |
dc.identifier.conferencename | 14th International Conference on Nuclear Microprobe Technology & Applications 2014 | en_AU |
dc.identifier.conferenceplace | Palazzo del Bo and Centro Culturale San Gaetano, Padova, Italy. | en_AU |
dc.identifier.conferencestartdate | 6 July 2014 | en_AU |
dc.identifier.editors | Butz, T., Reinert, T., & Spemann, D. | en_AU |
dc.identifier.govdoc | 6008 | en_AU |
dc.identifier.issn | 0168-583X | en_AU |
dc.identifier.journaltitle | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | en_AU |
dc.identifier.pagination | 233-239 | en_AU |
dc.identifier.uri | http://dx.doi.org/10.1016/j.nimb.2014.12.064 | en_AU |
dc.identifier.uri | http://apo.ansto.gov.au/dspace/handle/10238/6159 | en_AU |
dc.identifier.volume | 348 | en_AU |
dc.language.iso | en | en_AU |
dc.publisher | Elsevier | en_AU |
dc.subject | Silicon carbides | en_AU |
dc.subject | Ion beams | en_AU |
dc.subject | Radiation effects | en_AU |
dc.subject | Radiation hardness | en_AU |
dc.subject | Schottky barrier diodes | en_AU |
dc.subject | Deep level transient spectroscopy | en_AU |
dc.title | Radiation hardness of n-type SiC Schottky barrier diodes irradiated with MeV He ion microbeam | en_AU |
dc.type | Conference Paper | en_AU |
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