Model surfaces produced by atomic layer deposition

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dc.contributor.authorWalsh, RBen_AU
dc.contributor.authorHoward, SCen_AU
dc.contributor.authorNelson, Aen_AU
dc.contributor.authorSkinner, WMen_AU
dc.contributor.authorLiu, GMen_AU
dc.contributor.authorCraig, VSJen_AU
dc.date.accessioned2014-05-09T01:52:41Zen_AU
dc.date.available2014-05-09T01:52:41Zen_AU
dc.date.issued2012-10-05en_AU
dc.date.statistics2014-05-09en_AU
dc.description.abstractAtomic layer deposition is used with the aim of producing new model surfaces suitable for fundamental wet surface science investigations. Alumina surfaces are found to dissolve in aqueous solutions, although they can be passivated against dissolution by adsorption. Highly useful thick titania films can be produced by employing low temperatures during formation, whereas hafnia and zirconia films have a tendency to produce films that crystallize, and this increases the roughness of the films. © 2012, The Chemical Society of Japan.en_AU
dc.identifier.citationWalsh, R. B., Howard, S. C., Nelson, A., Skinner, W. M., Liu, G. M., & Craig, V. S. J. (2012). Model surfaces produced by atomic layer deposition. Chemistry Letters, Special Issue for IACIS2012, 41(10), 1247-1249. doi:10.1246/cl.2012.1247en_AU
dc.identifier.govdoc4772en_AU
dc.identifier.issn0366-7022en_AU
dc.identifier.issue10en_AU
dc.identifier.journaltitleChemistry Lettersen_AU
dc.identifier.pagination1247-1249en_AU
dc.identifier.urihttp://dx.doi.org/10.1246/cl.2012.1247en_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/5558en_AU
dc.identifier.volume41en_AU
dc.language.isoenen_AU
dc.publisherChemical Society of Japanen_AU
dc.subjectAdhesionen_AU
dc.subjectFilmsen_AU
dc.subjectTemperature range 0065-0273 Ken_AU
dc.subjectHafniumen_AU
dc.subjectZirconiumen_AU
dc.subjectCrystalsen_AU
dc.titleModel surfaces produced by atomic layer depositionen_AU
dc.typeJournal Articleen_AU
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