Synthesis of self-assembled island-structured complex oxide dielectric films

dc.contributor.authorSriram, Sen_AU
dc.contributor.authorBhaskaran, Men_AU
dc.contributor.authorKostovski, Gen_AU
dc.contributor.authorMitchell, DRGen_AU
dc.contributor.authorStoddart, PRen_AU
dc.contributor.authorAustin, MWen_AU
dc.contributor.authorMitchell, Aen_AU
dc.date.accessioned2010-04-08T06:00:56Zen_AU
dc.date.accessioned2010-04-30T05:04:10Zen_AU
dc.date.available2010-04-08T06:00:56Zen_AU
dc.date.available2010-04-30T05:04:10Zen_AU
dc.date.issued2009-09-24en_AU
dc.date.statistics2009-09-24en_AU
dc.description.abstractA self-assembly driven process to synthesize island-structured dielectric films is presented. An intermetallic reaction in platinized silicon substrates provides preferential growth sites for the complex oxide dielectric layer. Microscopy and spectroscopy analyses have been used to propose a mechanism for this structuring process. This provides a simple and scalable process to synthesize films with increased surface area for sensors, especially those materials with a complex chemistry. The ability of these island-structured dielectric films to improve sensitivity by a factor of 100 compared to continuous films in applications as substrates for surface-enhanced Raman scattering (SERS) is demonstrated. © 2009, American Chemical Societyen_AU
dc.identifier.citationSriram, S., Bhaskaran, M., Kostovski, G., Mitchell, D. R. G., Stoddart, P. R., Austin, M. W., & Mitchell, A. (2009). Synthesis of self-assembled island-structured complex oxide dielectric films. Journal of Physical Chemistry C, 113(38), 16610-16614. doi:10.1021/jp904832zen_AU
dc.identifier.govdoc1269en_AU
dc.identifier.issn1932-7447en_AU
dc.identifier.issue38en_AU
dc.identifier.journaltitleJournal of Physical Chemistry Cen_AU
dc.identifier.pagination16610-16614en_AU
dc.identifier.urihttp://dx.doi.org/10.1021/jp904832zen_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/3116en_AU
dc.identifier.volume113en_AU
dc.language.isoenen_AU
dc.publisherAmerican Chemical Societyen_AU
dc.subjectDielectric materialsen_AU
dc.subjectSiliconen_AU
dc.subjectSensitivityen_AU
dc.subjectRaman spectroscopyen_AU
dc.subjectMicroscopyen_AU
dc.subjectSurface areaen_AU
dc.titleSynthesis of self-assembled island-structured complex oxide dielectric filmsen_AU
dc.typeJournal Articleen_AU
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