Ion-irradiation-induced amorphization of Cu nanoparticles embedded in SiO2

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dc.contributor.authorJohannessen, Ben_AU
dc.contributor.authorKluth, Pen_AU
dc.contributor.authorLlewellyn, DJen_AU
dc.contributor.authorForan, GJen_AU
dc.contributor.authorCookson, DJen_AU
dc.contributor.authorRidgway, MCen_AU
dc.date.accessioned2008-04-24T01:35:59Zen_AU
dc.date.accessioned2010-04-30T05:02:50Zen_AU
dc.date.available2008-04-24T01:35:59Zen_AU
dc.date.available2010-04-30T05:02:50Zen_AU
dc.date.issued2007-11en_AU
dc.date.statistics2007-11en_AU
dc.description.abstractElemental Cu nanoparticles embedded in SiO2 were irradiated with 5 MeV Sn3+. The nanoparticle structure was studied as a function of Sn3+ fluence by extended x-ray absorption fine structure spectroscopy, small-angle x-ray scattering, and transmission electron microscopy. Prior to irradiation, Cu nanoparticles exhibited the face-centered-cubic structure. Upon irradiation at intermediate fluences (1×1013 to 1×1014 ions/cm2), the first nearest neighbor Cu-Cu coordination number decreased, while the Debye-Waller factor, bondlength, and third cumulant of the bondlength distribution increased. In particular, at a fluence of 1×1014 ions/cm2 we argue for the presence of an amorphous Cu phase, for which we deduce the structural parameters. Low temperature annealing (insufficient for nanoparticle growth) of the amorphous Cu returned the nanoparticles to the initial preirradiation structure. At significantly higher irradiation fluences (1×1015 to 1×1016 ions/cm2), the nanoparticles were dissolved in the matrix with a Cu coordination similar to that of Cu2O. © 2007, American Physical Societyen_AU
dc.identifier.articlenumber184203en_AU
dc.identifier.citationJohannessen, B., Kluth, P., Llewellyn, D. J., Foran, G. J., Cookson, D. J., & Ridgway, M. C. (2007). Ion-irradiation-induced amorphization of Cu nanoparticles embedded in SiO2. Physical Review B, 76(18), 184203. doi:10.1103/PhysRevB.76.184203en_AU
dc.identifier.govdoc1179en_AU
dc.identifier.issn1098-0121en_AU
dc.identifier.issue18en_AU
dc.identifier.journaltitlePhysical Review Ben_AU
dc.identifier.urihttp://dx.doi.org/10.1103/PhysRevB.76.184203en_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/1121en_AU
dc.identifier.volume76en_AU
dc.language.isoenen_AU
dc.publisherAmerican Physical Societyen_AU
dc.subjectAbsorptionen_AU
dc.subjectSmall angle scatteringen_AU
dc.subjectIon implantationen_AU
dc.subjectMetalsen_AU
dc.subjectCrystalsen_AU
dc.subjectStabilityen_AU
dc.subjectAluminiumen_AU
dc.subjectSilicaen_AU
dc.subjectCopperen_AU
dc.titleIon-irradiation-induced amorphization of Cu nanoparticles embedded in SiO2en_AU
dc.typeJournal Articleen_AU
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