Creation of microstructures using heavy ion beam lithography

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dc.contributor.authorVarasanec, Men_AU
dc.contributor.authorBogdanović-Radović, Ien_AU
dc.contributor.authorPastuovic, Zen_AU
dc.contributor.authorJakšić, Men_AU
dc.date.accessioned2012-04-19T04:31:17Zen_AU
dc.date.available2012-04-19T04:31:17Zen_AU
dc.date.issued2011-10-15en_AU
dc.date.statistics2012-04-19en_AU
dc.description.abstractIn this work, three-dimensional (3D) structures were produced in PMMA and CR-39 polymer resists using a carbon ion microbeam. To investigate possible advantages of heavy ions compared to the well-established proton beam lithography, the same resist materials were also irradiated with protons that had a range in the materials studied here similar to that of carbon ions. The microstructures produced in different resists were analysed after chemical etching. The quality of the bottom and side walls of the structures produced by protons and carbon ions were compared using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The results showed that, for the resist materials tested, lithographic structures made with the 8 MeV carbon beam had more rough lateral and bottom surfaces compared to those made with 0.6 MeV proton beam lithography. (C) 2011 Elsevier B.V.en_AU
dc.identifier.citationVarasanec, M., Bogdanović-Radović, I., Pastuovic, Z., Jakšić, M. (2011). Creation of microstructures using heavy ion beam lithography. Paper presented at the 12th International Conference on Nuclear Microprobe Technology and Applications, 26-30 July 2010, Germany. In Butz, T., Reinhart, T., & Spemann, D. (Eds), Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 269(20), 2413-2416. doi:10.1016/j.nimb.2011.02.056en_AU
dc.identifier.conferenceenddate30 July 2010en_AU
dc.identifier.conferencename12th International Conference on Nuclear Microprobe Technology and Applicationsen_AU
dc.identifier.conferenceplaceGermanyen_AU
dc.identifier.conferencestartdate26 July 2010en_AU
dc.identifier.editorsButz, T., Reinhart, T., & Spemann, D.en_AU
dc.identifier.govdoc4064en_AU
dc.identifier.issn0168-583Xen_AU
dc.identifier.issue20en_AU
dc.identifier.journaltitleNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atomsen_AU
dc.identifier.pagination2413-2416en_AU
dc.identifier.urihttp://dx.doi.org/10.1016/j.nimb.2011.02.056en_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/4176en_AU
dc.identifier.volume269en_AU
dc.language.isoenen_AU
dc.publisherElsevieren_AU
dc.subjectHeavy ionsen_AU
dc.subjectIon beamsen_AU
dc.subjectMicrostructureen_AU
dc.subjectProton radiographyen_AU
dc.subjectScanning electron microscopyen_AU
dc.subjectAtomic force microscopyen_AU
dc.titleCreation of microstructures using heavy ion beam lithographyen_AU
dc.typeConference Paperen_AU
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