Improved electromechanical sensitivity of polymer thin films containing carbon clusters produced in situ by irradiation with metal ions

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dc.contributor.authorMurugaraj, Pen_AU
dc.contributor.authorMainwaring, DEen_AU
dc.contributor.authorKhelil, NAen_AU
dc.contributor.authorPeng, JLen_AU
dc.contributor.authorSiegele, Ren_AU
dc.contributor.authorSawant, Pen_AU
dc.date.accessioned2010-11-15T00:21:10Zen_AU
dc.date.available2010-11-15T00:21:10Zen_AU
dc.date.issued2010-12en_AU
dc.date.statistics2010-12en_AU
dc.description.abstractGreatly enhanced electromechanical sensitivities were observed in ion beam irradiated polyimide films, where high resolution transmission electron microscopy and atomic force microscopy studies showed that 5.5 MeV Cu3+ ions produce randomly dispersed and highly oriented conducting nanochannels containing carbon clusters in polyimide with considerable overlap and narrow tunnel gap distributions between neighbouring nanochannels. Selected area electron diffraction studies confirmed the graphitic structure of these carbon clusters and also showed that the graphitic layers had preferential orientation parallel to the ion beam direction arising from relaxation of the graphitic layers within the nanochannels relieving local surface stresses in the polyimide matrix generated during irradiation as well as alignment of graphitic basal layers by volatile gases formed during irradiation escaping to the surface minimising resistance to gas flow. Electron energy loss spectroscopy also confirmed the graphitic structure of these carbon clusters within the nanochannels. Film electrical resistance increased exponentially with applied strain demonstrating the dominant role of tunnel gap modulation under strain. Gauge factors >1000 were achieved in these films at >3000 μstrains. Narrow distribution of tunnel gaps between the overlapping nanochannels is responsible for the high electromechanical sensitivities observed in these films compared to carbon nanotube–polymer (50) films. © 2010, Elsevier Ltd.en_AU
dc.identifier.citationMurugaraj, P., Mainwaring, D., Khelil, N. A., Peng, J. L., Siegele, R., & Sawant, P. (2010). Improved electromechanical sensitivity of polymer thin films containing carbon clusters produced in situ by irradiation with metal ions. Carbon, 48(15), 4230-4237. doi:10.1016/j.carbon.2010.07.026en_AU
dc.identifier.govdoc3052en_AU
dc.identifier.issn0008-6223en_AU
dc.identifier.issue15en_AU
dc.identifier.journaltitleCarbonen_AU
dc.identifier.pagination4230-4237en_AU
dc.identifier.urihttp://dx.doi.org/10.1016/j.carbon.2010.07.026en_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/2860en_AU
dc.identifier.volume48en_AU
dc.language.isoenen_AU
dc.publisherElsevieren_AU
dc.subjectThin filmsen_AU
dc.subjectCarbonen_AU
dc.subjectIrradiationen_AU
dc.subjectSensitivityen_AU
dc.subjectIon beamsen_AU
dc.subjectElectromechanicsen_AU
dc.titleImproved electromechanical sensitivity of polymer thin films containing carbon clusters produced in situ by irradiation with metal ionsen_AU
dc.typeJournal Articleen_AU
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