Direct measurement of van der waals and diffuse double-layer forces between titanium dioxide surfaces produced by atomic layer deposition

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dc.contributor.authorWalsh, RBen_AU
dc.contributor.authorNelson, Aen_AU
dc.contributor.authorSkinner, WMen_AU
dc.contributor.authorParsons, DFen_AU
dc.contributor.authorCraig, VSJen_AU
dc.date.accessioned2012-06-20T01:27:05Zen_AU
dc.date.available2012-06-20T01:27:05Zen_AU
dc.date.issued2012-04-12en_AU
dc.date.statistics2012-06-20en_AU
dc.description.abstractThe van der Waals forces between titanium dioxide surfaces produced by atomic layer deposition (ALD) at the isoelectric point have been measured and found to agree with the calculated interaction using Lifshitz theory. It is shown that under the right conditions very smooth ALD surfaces are produced. At pH values slightly below and above the isoelectric point, a repulsive diffuse double-layer repulsion was observed and is attributed to positive and negative charging of the surfaces, respectively. At high pH, it was found that the forces remained repulsive up until contact and no van der Waals attraction or adhesion was evident. The absence of an attraction cannot be explained by the presence of hydration forces.© 2012, American Chemical Societyen_AU
dc.identifier.citationWalsh, R. B., Nelson, A., Skinner, W. M., Parsons, D., Craig, V. S. J. (2012). Direct Measurement of van der waals and diffuse double-layer forces between titanium dioxide surfaces produced by atomic layer deposition. Journal of Physical Chemistry C, 116(14), 7838-7847. doi:10.1021/jp300533men_AU
dc.identifier.govdoc4391en_AU
dc.identifier.issn1932-7447en_AU
dc.identifier.issue14en_AU
dc.identifier.journaltitleJournal of Physical Chemistry Cen_AU
dc.identifier.pagination7838-7847en_AU
dc.identifier.urihttp://dx.doi.org/10.1021/jp300533men_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/4342en_AU
dc.identifier.volume116en_AU
dc.language.isoenen_AU
dc.publisherAmerican Chemical Societyen_AU
dc.subjectDepositionen_AU
dc.subjectTitaniumen_AU
dc.subjectVan der Waals forcesen_AU
dc.subjectThin filmsen_AU
dc.subjectSilicaen_AU
dc.subjectOxidesen_AU
dc.titleDirect measurement of van der waals and diffuse double-layer forces between titanium dioxide surfaces produced by atomic layer depositionen_AU
dc.typeJournal Articleen_AU
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