Probability of divacancy trap production in silicon diodes exposed to focused ion beam irradiation

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dc.contributor.authorPastuovic, Zen_AU
dc.contributor.authorVittone, Een_AU
dc.contributor.authorCapan, Ien_AU
dc.contributor.authorJakšić, Men_AU
dc.date.accessioned2011-12-13T01:27:55Zen_AU
dc.date.available2011-12-13T01:27:55Zen_AU
dc.date.issued2011-02-28en_AU
dc.date.statistics2011-12-13en_AU
dc.description.abstractWe present ion beam induced charge (IBIC) measurements of the critical displacement damage dose D(d) values and modeling of the probability of divacancy trap production in p(+)-n-n(+) silicon diodes exposed to megaelectron volt energy ion beam irradiation. The normalized induced charge (Q(0)/Q) measured by He ion probe in tested silicon diodes irradiated by focused He, Li, O, and Cl ion beams with energies of about 0.3 MeV/u increases linearly with D(d) according to the modified radiation damage function and nonionizing energy loss (NIEL) theory. A simple IBIC model based on Gunn theorem showed clear dependence of the induced charge Q and corresponding equivalent damage factor Ked value on both a depth profile of charge created by ionizing particle (probe) and a depth distribution of stable defects created from primary defects produced by damaging ions. The average probability of the divacancy production (defined as the ratio of the final electrical active defect quantity and primary ion induced vacancy quantity for each impinging ion) of 0.18 (18%) was calculated by the IBIC modeling for all damaging ions. (C) 2011 American Institute of Physics. [doi:10.1063/1.3559000]en_AU
dc.identifier.articlenumber92101en_AU
dc.identifier.citationPastuovic, Z., Vittone, E., Capan, I., & Jakšić, M. (2011). Probability of divacancy trap production in silicon diodes exposed to focused ion beam irradiation. Applied Physics Letters, 98(9), 092101. doi:10.1063/1.3559000en_AU
dc.identifier.govdoc3761en_AU
dc.identifier.issn0168-9002en_AU
dc.identifier.issue9en_AU
dc.identifier.journaltitleApplied Physics Lettersen_AU
dc.identifier.urihttp://dx.doi.org/10.1063/1.3559000en_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/3933en_AU
dc.identifier.volume98en_AU
dc.language.isoenen_AU
dc.publisherAmerican Institute of Physicsen_AU
dc.subjectSilicon diodesen_AU
dc.subjectIon beamsen_AU
dc.subjectIrradiationen_AU
dc.subjectRadiolysisen_AU
dc.subjectHeliumen_AU
dc.subjectLithiumen_AU
dc.subjectChlorineen_AU
dc.subjectOxygenen_AU
dc.titleProbability of divacancy trap production in silicon diodes exposed to focused ion beam irradiationen_AU
dc.typeJournal Articleen_AU
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