Cathodic arc co-deposition of highly oriented hexagonal Ti and Ti2AlC MAX phase thin films

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dc.contributor.authorGuenette, MCen_AU
dc.contributor.authorTucker, MDen_AU
dc.contributor.authorIonescu, Men_AU
dc.contributor.authorBilek, MMMen_AU
dc.contributor.authorMcKenzie, DRen_AU
dc.date.accessioned2010-11-14T23:14:43Zen_AU
dc.date.available2010-11-14T23:14:43Zen_AU
dc.date.issued2009-08-25en_AU
dc.date.statistics2009-08-25en_AU
dc.description.abstractTi2AlC belongs to a family of ternary nanolaminate alloys known as the MAX phases, which exhibit a unique combination of metallic and ceramic properties. Here we report pulsed cathodic arc deposition of c axis normal oriented Ti2AlC thin films on α-Al2O3 (001) single crystal substrates heated to 900°C, without an intentionally pre-deposited seed layer. Oriented hexagonal Ti is observed in some films and an in-plane epitaxial relationship between the α-Al2O3 (001) substrate, the hexagonal Ti and Ti2AlC MAX phase is observed. We observe formation of the Ti2AlC phase in all films despite variations in elemental composition. The electrical resistivity of our films was in the range 0.48–0.67 μΩ m, higher than other values found for Ti2AlC in the literature. © Elsevier B.V.en_AU
dc.identifier.citationGuenette, M. C., Tucker, M. D., Ionescu, M., Bilek, M. M. M., & McKenzie, D. R. (2009). Cathodic arc co-deposition of highly oriented hexagonal Ti and Ti2AlC MAX phase thin films. Romanian Conference on Advanced Materials (ROCAM 2009), 25th - 28th August 2009. Brasov, Romania: Transilvania University Aula. In Thin Solid Films, 519(2), 766-769. doi:10.1016/j.tsf.2010.09.007en_AU
dc.identifier.conferenceenddate28 August 2009en_AU
dc.identifier.conferencenameRomanian Conference on Advanced Materials (ROCAM 2009en_AU
dc.identifier.conferenceplaceBrasov, Romaniaen_AU
dc.identifier.conferencestartdate25 August 2009en_AU
dc.identifier.govdoc3049en_AU
dc.identifier.issn0040-6090en_AU
dc.identifier.issue2en_AU
dc.identifier.journaltitleThin Solid Filmsen_AU
dc.identifier.pagination766-769en_AU
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2010.09.007en_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/2857en_AU
dc.identifier.volume519en_AU
dc.language.isoenen_AU
dc.publisherElsevieren_AU
dc.subjectX-ray diffractionen_AU
dc.subjectThin filmsen_AU
dc.subjectPhysical vapor depositionen_AU
dc.subjectEpitaxyen_AU
dc.subjectMonocrystalsen_AU
dc.subjectTitaniumen_AU
dc.titleCathodic arc co-deposition of highly oriented hexagonal Ti and Ti2AlC MAX phase thin filmsen_AU
dc.typeConference Paperen_AU
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