Low temperature atomic layer deposition of titania thin films

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dc.contributor.authorTriani, Gen_AU
dc.contributor.authorCampbell, JAen_AU
dc.contributor.authorEvans, PJen_AU
dc.contributor.authorDavis, Jen_AU
dc.contributor.authorLatella, BAen_AU
dc.contributor.authorBurford, RPen_AU
dc.date.accessioned2010-07-05T01:58:37Zen_AU
dc.date.available2010-07-05T01:58:37Zen_AU
dc.date.issued2010-04-02en_AU
dc.date.statistics2010-04-02en_AU
dc.description.abstractThis paper presents a comprehensive study of atomic layer deposition of TiO2 films on silicon and polycarbonate substrates using TiCl4 and H2O as precursors at temperatures in the range 80–120°C. An in-situ quartz crystal microbalance was used to monitor different processing conditions and the resultant films were characterised ex-situ using a suite of surface analytical tools. In addition, the contact angle and wettability of as-deposited and UV irradiated films were assessed. The latter was found to reduce the contact angle from ≥ 80° to < 10°. Finally, the effect of surface pre-treatment on film toughness and adhesion was investigated and the results show a significant improvement for the pre-treated films. © 2010, Elsevier Ltd.en_AU
dc.identifier.citationTriani, G., Campbell, J. A., Evans, P. J., Davis, J., Latella, B. A., & Burford, R. P. (2010). Low temperature atomic layer deposition of titania thin films. Thin Solid Films, 518(12), 3182-3189. doi:10.1016/j.tsf.2009.09.010en_AU
dc.identifier.govdoc1850en_AU
dc.identifier.issn0040-6090en_AU
dc.identifier.issue12en_AU
dc.identifier.journaltitleThin Solid Filmsen_AU
dc.identifier.pagination3182-3189en_AU
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2009.09.010en_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/1751en_AU
dc.identifier.volume518en_AU
dc.language.isoenen_AU
dc.publisherElsevieren_AU
dc.subjectDepositionen_AU
dc.subjectTitaniumen_AU
dc.subjectPolymersen_AU
dc.subjectSubstratesen_AU
dc.subjectAdhesionen_AU
dc.subjectTensile propertiesen_AU
dc.titleLow temperature atomic layer deposition of titania thin filmsen_AU
dc.typeJournal Articleen_AU
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