Transient conductance technique for characterisation of deep-level defects in highly irradiated detector-grade silicon

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dc.contributor.authorAlexiev, Den_AU
dc.contributor.authorReinhard, MIen_AU
dc.contributor.authorMo, Len_AU
dc.contributor.authorRosenfeld, ABen_AU
dc.date.accessioned2010-08-23T23:55:33Zen_AU
dc.date.available2010-08-23T23:55:33Zen_AU
dc.date.issued1999-09-11en_AU
dc.date.statistics1999-09-11en_AU
dc.description.abstractThe use of conventional capacitance-based deep-level transient spectroscopy is not applicable when defect concentrations approach the background carrier concentration. Due to this limitation the technique cannot be used for examining heavily irradiated silicon, or semi-insulating semiconductor materials. Optical deep-level transient conductance spectroscopy can overcome the limitations of capacitance-based techniques through the measurement of a conductance transient measured with a marginal oscillator. This paper provides details of the application of this method to heavily damaged high-purity silicon. Silicon-based PIN detector structures irradiated with 1 MeV neutrons, to approximately 3×1013 n/cm2 and detectors irradiated with 24 GeV/c protons, to 3.8×1013 p/cm2, were examined. © 1999, Elsevier Ltd.en_AU
dc.identifier.citationAlexiev, D., Reinhard, M. I., Mo, L., & Rosenfeld, A. (1999). Transient conductance technique for characterisation of deep-level defects in highly irradiated detector-grade silicon. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 434(1), 103-113. doi:10.1016/S0168-9002(99)00441-6en_AU
dc.identifier.govdoc2521en_AU
dc.identifier.issn0168-9002en_AU
dc.identifier.issue1en_AU
dc.identifier.journaltitleNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipmenten_AU
dc.identifier.pagination103-113en_AU
dc.identifier.urihttp://dx.doi.org/10.1016/S0168-9002(99)00441-6en_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/2321en_AU
dc.identifier.volume434en_AU
dc.language.isoenen_AU
dc.publisherElsevieren_AU
dc.subjectSiliconen_AU
dc.subjectDeep level transient spectroscopyen_AU
dc.subjectDefectsen_AU
dc.subjectIrradiationen_AU
dc.subjectCapacitanceen_AU
dc.subjectOscillatorsen_AU
dc.titleTransient conductance technique for characterisation of deep-level defects in highly irradiated detector-grade siliconen_AU
dc.typeJournal Articleen_AU
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