Effect of vacuum annealing on the phase stability of Ti3SiC2

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dc.contributor.authorLow, IMen_AU
dc.contributor.authorOo, Zen_AU
dc.contributor.authorPrince, KEen_AU
dc.date.accessioned2009-11-11T04:31:01Zen_AU
dc.date.accessioned2010-04-30T05:02:15Zen_AU
dc.date.available2009-11-11T04:31:01Zen_AU
dc.date.available2010-04-30T05:02:15Zen_AU
dc.date.issued2007-08en_AU
dc.date.statistics2007-08en_AU
dc.description.abstractThe effect of vacuum annealing on the thermal stability and phase transition of Ti3SiC2 has been investigated by X-ray diffraction (XRD), neutron diffraction, synchrotron radiation diffraction, and secondary ion mass spectroscopy (SIMS). In the presence of vacuum or a controlled atmosphere of low oxygen partial pressure, Ti3SiC2 undergoes a surface dissociation to form nonstoichiometric TiC and/or Ti5Si3Cx that commences at ~1200°C and becomes very pronounced at ≥ 1500°C. Composition depth profiling at the near surface of vacuum-annealed Ti3SiC2 by XRD and SIMS revealed a distinct gradation in the phase distribution of TiC and Ti5Si3Cx with depth. © 2007, Wiley-Blackwell. The definitive version is available at www3.interscience.wiley.comen_AU
dc.identifier.citationLow, I. M., Oo, Z., & Prince, K. E. (2007). Effect of vacuum annealing on the phase stability of Ti3SiC2. Journal of the American Ceramic Society, 90(8), 2610-2614. doi:10.1111/j.1551-2916.2007.01817.xen_AU
dc.identifier.govdoc1138en_AU
dc.identifier.issn0002-7820en_AU
dc.identifier.issue8en_AU
dc.identifier.journaltitleJournal of the American Ceramic Societyen_AU
dc.identifier.pagination2610-2614en_AU
dc.identifier.urihttp://dx.doi.org/10.1111/j.1551-2916.2007.01817.xen_AU
dc.identifier.urihttp://apo.ansto.gov.au/dspace/handle/10238/2272en_AU
dc.identifier.volume90en_AU
dc.language.isoenen_AU
dc.publisherWiley-Blackwellen_AU
dc.subjectAnnealingen_AU
dc.subjectPhase stabilityen_AU
dc.subjectX-ray diffractionen_AU
dc.subjectNeutron diffractionen_AU
dc.subjectSynchrotron radiationen_AU
dc.subjectMass spectroscopyen_AU
dc.titleEffect of vacuum annealing on the phase stability of Ti3SiC2en_AU
dc.typeJournal Articleen_AU
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