Precise tuning chemistry and tailoring defects of graphene oxide films by low energy ion beam irradiation

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dc.contributor.authorWei, Yen_AU
dc.contributor.authorPastuovic, Zen_AU
dc.contributor.authorMurphy, Ten_AU
dc.contributor.authorGore, DBen_AU
dc.date.accessioned2025-03-13T04:27:22Zen_AU
dc.date.available2025-03-13T04:27:22Zen_AU
dc.date.issued2020-03-01en_AU
dc.date.statistics2025-02-05en_AU
dc.descriptionWe acknowledge the National Collaborative Research Infrastructure Strategy (NCRIS) funding provided by the Australian Government for this research. Y. Wei thanks the Australian Government for his International Research Training Program (iRTP) scholarship. We thank Dr Chao Shen from the Microscopy Unit in the Faculty of Science and Engineering, Macquarie University, Australia for technical assistance.en_AU
dc.description.abstractPrecise tuning chemistry and tailoring nanopores of graphene oxide (GO) thin films are vital for their application for liquid and gas separation. In this work, ultra-thin GO films with thicknesses of about 150 nm were prepared and then modified by a low energy carbon ion beam with ion fluences ranging from 1 × 1015 ions·cm−2 to 1 × 1017 ions·cm−2. An ion fluence of 1 × 1016 ions·cm−2 is a threshold for the changes to the surface geometry (i.e. the chemical state and the consequent morphology) of the GO films. Moreover, X-ray photoelectron spectroscopy (XPS) reveals that oxygen loss in ion beam-induced reduction of GO films was mainly by the elimination of the unstable C[dbnd]O species. Raman spectroscopy indicates that a mass of defects with a mean defect distance of about 1.4 nm was generated in GO films by C+ irradiation. According to SRIM simulation, an average of 208 carbon vacancies were created in the GO film per impinging C+. These results suggest that low energy carbon ion beam irradiation is promising for simultaneously reducing and drilling nanoscale pores on GO surfaces in a controllable manner, which could be used for engineering GO-based separation membranes. © 2019 Published by Elsevier B.V.en_AU
dc.identifier.articlenumber144651en_AU
dc.identifier.citationWei, Y., Pastuovic, Z., Murphy, T., & Gore, D. B. (2020). Precise tuning chemistry and tailoring defects of graphene oxide films by low energy ion beam irradiation. Applied Surface Science, 505, 144651. doi:10.1016/j.apsusc.2019.144651en_AU
dc.identifier.issn0169-4332en_AU
dc.identifier.journaltitleApplied Surface Scienceen_AU
dc.identifier.urihttps://doi.org/10.1016/j.apsusc.2019.144651en_AU
dc.identifier.urihttps://apo.ansto.gov.au/handle/10238/16050en_AU
dc.identifier.volume505en_AU
dc.languageEnglishen_AU
dc.language.isoenen_AU
dc.publisherElsevieren_AU
dc.subjectChemistryen_AU
dc.subjectGrapheneen_AU
dc.subjectOxidesen_AU
dc.subjectFilmsen_AU
dc.subjectIon beamsen_AU
dc.subjectIrradiationen_AU
dc.subjectSpectroscopyen_AU
dc.subjectRaman spectroscopyen_AU
dc.subjectIonsen_AU
dc.subjectkeV rangeen_AU
dc.titlePrecise tuning chemistry and tailoring defects of graphene oxide films by low energy ion beam irradiationen_AU
dc.typeJournal Articleen_AU
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