Investigation and optimization of reactive ion etching of Si3N4 and polyphthalaldehyde for two-step gray scale fabrication of diffractive optics

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dc.contributor.authorAminzadeh, Aen_AU
dc.contributor.authorBose, Men_AU
dc.contributor.authorSmith, Den_AU
dc.contributor.authorUddin, MHen_AU
dc.contributor.authorPeele, AGen_AU
dc.contributor.authorvan Riessen, GAen_AU
dc.date.accessioned2023-11-30T22:36:14Zen_AU
dc.date.available2023-11-30T22:36:14Zen_AU
dc.date.issued2019-11-18en_AU
dc.date.statistics2023-04-27en_AU
dc.description.abstractNanofabrication of x-ray diffractive optics using electron beam lithography requires a complex process of electron exposure optimization and resist development. Thermal scanning probe lithography (TSPL) offers a high resolution, maskless, gray scale patterning method with reduced complexity. Thin diffractive optics with high efficiency for the extreme ultraviolet (EUV) and soft x-ray (SXR) photon range could be fabricated by combining TSPL with a single etching step if the TSPL resist, polyphthalaldehyde (PPA), can be used as an etch mask to direct-etch the pattern into a substrate using reactive ion etching. This condition critically depends on high etch selectivity between the substrate and the PPA, because TSPL resolution deteriorates as the PPA patterning depth increases beyond tens of nanometers. In this work, the authors have evaluated the etch selectivity for PPA and Si3N4 using SF6/C4F8 gases and the influence of process parameters, including gas flow rate, vacuum pressure, radio frequency bias power, and inductively coupled plasma power. The experimental results indicate that an etch selectivity of 7 (Si3N4:PPA) is achievable, and the authors demonstrate that diffractive optics for EUV/SXR can be fabricated in only two steps. © 2023 AIPen_AU
dc.identifier.articlenumber1608en_AU
dc.identifier.citationAminzadeh, A., Bose, M., Smith, D., Uddin, M. H., Peele, A. G., & van Riessen, G. (2019). Investigation and optimization of reactive ion etching of Si3N4 and polyphthalaldehyde for two-step gray scale fabrication of diffractive optics. Journal of Vacuum Science & Technology B, 37(6), 1608. https://doi.org/10.1116/1.5121760en_AU
dc.identifier.issn2166-2754en_AU
dc.identifier.issue6en_AU
dc.identifier.journaltitleJournal of Vacuum Science & Technology Ben_AU
dc.identifier.urihttps://doi.org/10.1116/1.5121760en_AU
dc.identifier.urihttps://apo.ansto.gov.au/handle/10238/15254en_AU
dc.identifier.volume37en_AU
dc.language.isoenen_AU
dc.publisherAIPen_AU
dc.relation.urihttps://doi.org/10.1116/1.5121760en_AU
dc.subjectEtchingen_AU
dc.subjectIonsen_AU
dc.subjectFabricationen_AU
dc.subjectOpticsen_AU
dc.subjectBeamsen_AU
dc.subjectUltraviolet spectraen_AU
dc.subjectOpticsen_AU
dc.subjectGas flowen_AU
dc.titleInvestigation and optimization of reactive ion etching of Si3N4 and polyphthalaldehyde for two-step gray scale fabrication of diffractive opticsen_AU
dc.typeJournal Articleen_AU
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