Microstructure of Cr (N,O) thin films studied by high resolution transmission electron microscopy

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dc.contributor.authorSuzuki, Ken_AU
dc.contributor.authorSuematsu, Hen_AU
dc.contributor.authorThorogood, GJen_AU
dc.contributor.authorSuzuki, Ten_AU
dc.date.accessioned2022-04-21T05:51:45Zen_AU
dc.date.available2022-04-21T05:51:45Zen_AU
dc.date.issued2017-03-01en_AU
dc.date.statistics2022-03-31en_AU
dc.description.abstractIn order to obtain insight into the hardening mechanism of Cr(N,O) thin films with respect to increase in oxygen content, the microstructure of Cr(N,O) grains in thin films was studied. High resolution transmission electron microscopy provided evidence that the grains in Cr(N,O) thin films prepared by pulsed laser deposition, which have an oxygen content of > 27 mol%, contained stacking faults. Phase identification via electron diffraction, indicated that the grains consisted of two phases, which had a NaCl-type and corundum-type structure and these phases had the same orientation as that of the Cr0.67O thin film. The estimated stacking fault energy of Cr(N,O) with an oxygen content of 34 mol% was 20 mJ/m2. Our results revealed the Cr(N,O) grains had the same nano-lamellar morphology as that of the Cr0.67O thin film which supports the possibility that the nano-lamellar morphology was formed by the introduction of extended dislocations. It is also possible that the hardening of Cr(N,O) was caused by dislocation pinning at the boundaries of the nano-lamellar morphology. © 2017 Elsevier B.Ven_AU
dc.description.sponsorshipThis work was supported by Grant-in-Aid for Scientific Research 22686069.en_AU
dc.identifier.citationSuzuki, K., Suematsu, H., Thorogood, G. J., & Suzuki, T. (2017). Microstructure of Cr (N,O) thin films studied by high resolution transmission electron microscopy. Thin Solid Films, 625, 111-114. doi:10.1016/j.tsf.2017.01.062en_AU
dc.identifier.issn0040-6090en_AU
dc.identifier.journaltitleThin Solid Filmsen_AU
dc.identifier.pagination111-114en_AU
dc.identifier.urihttps://doi.org/10.1016/j.tsf.2017.01.062en_AU
dc.identifier.urihttps://apo.ansto.gov.au/dspace/handle/10238/13054en_AU
dc.identifier.volume625en_AU
dc.language.isoenen_AU
dc.publisherElsevieren_AU
dc.subjectChromiumen_AU
dc.subjectNitridesen_AU
dc.subjectAblationen_AU
dc.subjectStacking faultsen_AU
dc.subjectMicrostructureen_AU
dc.subjectThin filmsen_AU
dc.subjectTransmission electron microscopyen_AU
dc.titleMicrostructure of Cr (N,O) thin films studied by high resolution transmission electron microscopyen_AU
dc.typeJournal Articleen_AU
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