Characterisation of epitaxial TiO2 thin films grown on MgO(0 0 1) using atomic layer deposition

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dc.contributor.authorMitchell, DRGen_AU
dc.contributor.authorAttard, DJen_AU
dc.contributor.authorTriani, Gen_AU
dc.date.accessioned2023-10-02T23:55:10Zen_AU
dc.date.available2023-10-02T23:55:10Zen_AU
dc.date.issued2005-11-15en_AU
dc.date.statistics2023-09-18en_AU
dc.description.abstractThin films of TiO2 have been deposited onto MgO(0 0 1) substrates using atomic layer deposition at 300 °C. Plan and cross-sectional transmission electron microscopy (TEM), X-ray diffraction and atomic force microscopy have been used to understand the nature of the films. X-ray and electron diffraction showed that a polycrystalline, epitaxial anatase film was produced. The c-axis of the anatase was parallel to the MgO(0 0 1) surface with two orientational variants at right angles to each other in the plane of the film, each aligned with an MgO cube axis. Plan-view and cross-sectional TEM showed that the grain structure of the film reflected this orientation relationship, with the grain morphology comprising two sets of roughly tetragonal grains. Also present was a small fraction of equiaxed, anatase grains which were randomly oriented. Roughness measurement using atomic force microscopy showed that the epitaxial anatase films were quite smooth, in comparison to equivalent non-aligned films grown on silicon. Crown copyright © 2005. Published by Elsevier B.V.en_AU
dc.identifier.citationMitchell, D. R. G., Attard, D. J., & Triani, G. (2005). Characterisation of epitaxial TiO2 thin films grown on MgO(0 0 1) using atomic layer deposition. Journal of crystal growth, 285(1-2), 208-214. doi:10.1016/j.jcrysgro.2005.08.003en_AU
dc.identifier.issn0022-0248en_AU
dc.identifier.issue1-2en_AU
dc.identifier.journaltitleJournal of crystal growthen_AU
dc.identifier.pagination208-214en_AU
dc.identifier.urihttps://apo.ansto.gov.au/handle/10238/15135en_AU
dc.identifier.volume285en_AU
dc.language.isoenen_AU
dc.publisherElsevieren_AU
dc.relation.urihttps://doi.org/10.1016/j.jcrysgro.2005.08.003en_AU
dc.subjectEpitaxyen_AU
dc.subjectTitanium oxidesen_AU
dc.subjectThin Filmsen_AU
dc.subjectLayersen_AU
dc.subjectSubstratesen_AU
dc.subjectX-ray diffractionen_AU
dc.subjectTransmission electron microscopyen_AU
dc.subjectRoughnessen_AU
dc.titleCharacterisation of epitaxial TiO2 thin films grown on MgO(0 0 1) using atomic layer depositionen_AU
dc.typeJournal Articleen_AU
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