Properties of ALD Al2O3 protective coatings

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dc.contributor.authorEvans, PJen_AU
dc.contributor.authorMurai, Yen_AU
dc.contributor.authorLindsay, MJen_AU
dc.contributor.authorDavis, Jen_AU
dc.contributor.authorTriani, Gen_AU
dc.date.accessioned2023-10-03T01:42:49Zen_AU
dc.date.available2023-10-03T01:42:49Zen_AU
dc.date.issued2010-10-21en_AU
dc.date.statistics2023-09-11en_AU
dc.description.abstractIn recent years, atomic layer deposition (ALD) has emerged as a technology platform for nanofabrication [1]. This interest has evolved from its intrinsic advantages; inherent thickness control, the ability to prepare highly conformal pin-hole free films, low temperature film growth and its large area uniformity. These redeeming characteristics have broadened the application of ALD films in such diverse areas as encapsulation of nanoparticles [2], templating of complex structures [3] and the modification of membranes [4]. The deposition of atomic layer protective coatings on flexible polymers and metals is another target application to improve the lifetime performance of functional materials that may be susceptible to degradation [5]. In particular, the ingress of moisture and atmospheric gases as well as the effects of abrasion and thermal cycling can significantly diminish a material’s suitability in cases where its bulk properties meet all other requirements. Inorganic barrier coatings on flexible substrates are subject to additional constraints where the mechanical strength and adhesion of the protective coating are particularly important. In this study, ALD alumina coatings were deposited on flexible substrates including polycarbonate, polyethylene naphthalate (PEN), copper and titanium, to investigate their toughness and adhesion under tensile load. In addition, the effect of deposition conditions on the performance of these protective coatings will be presented. References H. Kim, H.B.R. Lee, and W.J. Maeng, Thin Solid Films, 517 (2009) 2563-2580. J.R. Scheffe, A. Frances, D.M. King, X. Liang, B.A. Branch, A.S. Cavanagh, S.M. George, and A.W. Weimer, Thin Solid Films, 517 (2009) 1874-1879. G. Triani, P.J. Evans, D.J. Attard, K.E. Prince, J Bartlett, S. Tan, and R.P. Burford, J. Mater. Chem., 16 (2006) 1355-1359. L.Velleman, G. Triani, P.J. Evans, J. G. Shapter, and D. Losic, Micropor. Mesopor. Mater. 126 (2009) 87-94. T. Hirkikorpi, M. Vaha-Nissi, T. Mustonen, E.Iiskola and M. Karppinen, Thin Solid Films, 518 (2010) 2654-2658en_AU
dc.identifier.articlenumberTF-ThP12en_AU
dc.identifier.citationEvans, P. J., Murai, Y. Lindsay, M., Davis, J., & Triani, G. (2010). Properties of ALD Al2O3 protective coatings. Poster presented to AVS 57th International Symposium & Exhibition, Albuquerque, New Mexico, 17 October - 22 October 2010. Retrieved from: http://www2.avs.org/symposium2010/Papers/Paper_TF-ThP12.htmlen_AU
dc.identifier.conferenceenddate2010-10-22en_AU
dc.identifier.conferencenameAVS 57th International Symposium & Exhibitionen_AU
dc.identifier.conferenceplaceAlbuquerque, New Mexicoen_AU
dc.identifier.conferencestartdate2010-10-17en_AU
dc.identifier.pagination228en_AU
dc.identifier.urihttps://apo.ansto.gov.au/handle/10238/15139en_AU
dc.language.isoenen_AU
dc.publisherAmerican Vacuum Societyen_AU
dc.relation.urihttp://www2.avs.org/symposium2010/Papers/Paper_TF-ThP12.htmlen_AU
dc.subjectLayersen_AU
dc.subjectAluminium oxidesen_AU
dc.subjectProtective coatingsen_AU
dc.subjectFabricationen_AU
dc.subjectThin Filmsen_AU
dc.subjectTemperature rangeen_AU
dc.subjectPolymersen_AU
dc.titleProperties of ALD Al2O3 protective coatingsen_AU
dc.typeConference Posteren_AU
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