Engineering titanium and aluminum oxide composites using atomic layer deposition

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dc.contributor.authorBiluš Abaffy, Nen_AU
dc.contributor.authorMcCulloch, DGen_AU
dc.contributor.authorPartridge, JGen_AU
dc.contributor.authorEvans, PJen_AU
dc.contributor.authorTriani, Gen_AU
dc.date.accessioned2023-10-06T04:33:37Zen_AU
dc.date.available2023-10-06T04:33:37Zen_AU
dc.date.issued2011-12-23en_AU
dc.date.statistics2023-09-25en_AU
dc.description.abstractMixed metal oxides provide a convenient means to produce coatings with tailored physical properties. We investigate the possibility of synthesizing novel coatings of mixed titanium and aluminum oxide using atomic layer deposition (ALD). Results show that ALD films were prepared with compositions ranging between Al2O3 and TiO2 having refractive indices between 1.6 and 2.4 (at λ = 550 nm) at low temperature. The microstructure and bonding environment within the films was investigated using electron microscopy and x-ray absorption spectroscopy. The films were amorphous, and the Ti and Al atoms were mixed at the atomic scale. The electrical breakdown characteristics of the films were measured and showed that films with intermediate compositions had poor leakage current properties, believed to be caused by the presence of distorted bonding configurations. This study shows that ALD can be used to deposit high quality thin films with tailored optical properties, particularly suitable for applications in which complex topographies are required. © 2011 American Institute of Physicsen_AU
dc.description.sponsorshipThe authors wish to thank the Australian Synchrotron, the Australian Institute of Nuclear Science and Engineering (AINSE) for providing financial assistance through a PGRA scholarship and research award; the Australian Nuclear Science and Technology Organisation (ANSTO) for use of its ALD facilities; the Department of Physics at the University of Sydney for use of the VASE; and Ju Lin Peng for TEM sample preparation.en_AU
dc.identifier.articlenumber123514en_AU
dc.identifier.citationBiluš Abaffy, N., McCulloch, D. G., Partridge, J. G., Evans, P. J., & Triani, G. (2011). Engineering titanium and aluminum oxide composites using atomic layer deposition. Journal of Applied Physics, 110(12), 123514. doi:10.1063/1.3667134en_AU
dc.identifier.issue12en_AU
dc.identifier.journaltitleJournal of Applied Physicsen_AU
dc.identifier.urihttps://apo.ansto.gov.au/handle/10238/15141en_AU
dc.identifier.volume110en_AU
dc.language.isoenen_AU
dc.publisherAIP Publishingen_AU
dc.relation.urihttps://doi.org/10.1063/1.3667134en_AU
dc.subjectTitaniumen_AU
dc.subjectAluminium oxidesen_AU
dc.subjectLayersen_AU
dc.subjectCoatingsen_AU
dc.subjectSynthesisen_AU
dc.subjectThin Filmsen_AU
dc.subjectSpectroscopyen_AU
dc.titleEngineering titanium and aluminum oxide composites using atomic layer depositionen_AU
dc.typeJournal Articleen_AU
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