Lamellae preparation for atomic-resolution STEM imaging from ion-beam-sensitive topological insulator crystals

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dc.contributor.authorBake, Aen_AU
dc.contributor.authorZhao, WYen_AU
dc.contributor.authorMitchell, DRGen_AU
dc.contributor.authorWang, XLen_AU
dc.contributor.authorNancarrow, Men_AU
dc.contributor.authorCortie, DLen_AU
dc.date.accessioned2023-01-30T04:31:48Zen_AU
dc.date.available2023-01-30T04:31:48Zen_AU
dc.date.issued2022-04-06en_AU
dc.date.statistics2022-05-06en_AU
dc.description.abstractGood specimen quality is a key factor in achieving successful scanning transmission electron microscope analysis. Thin and damage-free specimens are prerequisites for obtaining atomic-resolution imaging. Topological insulator single crystals and thin films in the chalcogenide family such as Sb2Te3 are sensitive to electron and ion beams. It is, therefore, challenging to prepare a lamella suitable for high-resolution imaging from these topological insulator materials using standard focused ion-beam instruments. We have developed a modified method to fabricate thin focused ion-beam (FIB) lamellae with minimal ion-beam damage and artefacts. The technique described in the current study enables the reliable preparation of high-quality transmission electron microscope (TEM) specimens necessary for studying ultra-thin surface regions. We have successfully demonstrated that the careful selection of FIB milling parameters at each stage minimizes the damage layer without the need for post-treatment. © 2022 Author(s). Published under an exclusive license by the AVS.en_AU
dc.identifier.articlenumber033203en_AU
dc.identifier.citationBake, A., Zhao, W., Mitchell, D., Wang, X., Nancarrow, M., & Cortie, D. (2022). Lamellae preparation for atomic-resolution STEM imaging from ion-beam-sensitive topological insulator crystals. Journal of Vacuum Science & Technology A, 40(3), 033203. doi:10.1116/6.0001771en_AU
dc.identifier.issn0734-2101en_AU
dc.identifier.issue3en_AU
dc.identifier.journaltitleJournal of Vacuum Science & Technology Aen_AU
dc.identifier.urihttps://doi.org/10.1116/6.0001771en_AU
dc.identifier.urihttps://apo.ansto.gov.au/dspace/handle/10238/14573en_AU
dc.identifier.volume40en_AU
dc.language.isoenen_AU
dc.publisherAIP Publishingen_AU
dc.subjectLamellaeen_AU
dc.subjectIon beamsen_AU
dc.subjectLayersen_AU
dc.subjectThin filmsen_AU
dc.subjectCrystalsen_AU
dc.subjectTransmission electron microscopyen_AU
dc.titleLamellae preparation for atomic-resolution STEM imaging from ion-beam-sensitive topological insulator crystalsen_AU
dc.typeJournal Articleen_AU
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