Chemically induced electric field: flat band potential engineering

No Thumbnail Available
Date
2012-10-05
Authors
Journal Title
Journal ISSN
Volume Title
Publisher
SPIE
Abstract
The present work considers engineering of the flat band potential, FBP, of metal oxides in a controlled manner. The aim is to minimise the energy losses related to recombination. The related experimental approaches include imposition of a chemically-induced electric field using the phenomena of segregation, diffusion and the formation of multilayer systems. This paper considers several basic phenomena that allow the modification of the surface charge and the space charge at the gas/solid and solid/liquid interfaces. © (2012) Society of Photo-Optical Instrumentation Engineers (SPIE).
Description
Keywords
Interfaces, Diffusion, Oxides, Oxygen, Solar energy, N-type conductors, Electrons, Ionization, Metals
Citation
Bak, T., Guo, Z., Li, W., Atanacio, A. J., & Nowotny, J. (2012). Chemically induced electric field: flat band potential engineering. In: Vayssieres, L. (ed), SPIE Solar Energy & Technology: Solar Hydrogen and Nanotechnology VII, 12-16 August, 2012, San Diego, California. (Vol. 8469, pp. 84690Q). Society of Photo-Optical Instrumentation Engineers (SPIE). doi:10.1117/12.927749
URI
https://doi.org/10.1117/12.927749
 https://apo.ansto.gov.au/dspace/handle/10238/10130
Collections
Conference Publications