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|Title: ||Synthesis and characterisation of ion-implanted epoxy composites for X-ray shielding|
|Authors: ||Azman, NZN|
|Issue Date: ||15-Sep-2012|
|Publisher: ||ELSEVIER SCIENCE BV|
|Citation: ||Azman, N. Z. N., Siddiqui, S. A., Ionescu, M., & Low, I. M. (2012). Synthesis and characterisation of ion-implanted epoxy composites for X-ray shielding. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials & Atoms, 287, 120-123.|
|Abstract: ||The epoxy samples were implanted with heavy ions such as tungsten (W), gold (Au) and lead (Pb) to investigate the attenuation characteristics of these composites. Near-surface composition depth profiling of ion-implanted epoxy systems was studied using Rutherford Backscattering Spectroscopy (RBS). The effect of implanted ions on the X-ray attenuation was studied with a general diagnostic X-ray machine with X-ray tube voltages from 40 to 100 kV at constant exposure 10 mAs. Results show that the threshold of implanted ions above which X-ray mass attenuation coefficient, mu(m), of the ion-implanted epoxy composite is distinguishably higher than the mu(m), of the pure epoxy sample is different for W, Au and Pb. © 2012, Elsevier Ltd.|
|Appears in Collections:||Journal Articles|
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