Direct measurement of van der waals and diffuse double-layer forces between titanium dioxide surfaces produced by atomic layer deposition
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Date
2012-04-12
Journal Title
Journal ISSN
Volume Title
Publisher
American Chemical Society
Abstract
The van der Waals forces between titanium dioxide surfaces produced by atomic layer deposition (ALD) at the isoelectric point have been measured and found to agree with the calculated interaction using Lifshitz theory. It is shown that under the right conditions very smooth ALD surfaces are produced. At pH values slightly below and above the isoelectric point, a repulsive diffuse double-layer repulsion was observed and is attributed to positive and negative charging of the surfaces, respectively. At high pH, it was found that the forces remained repulsive up until contact and no van der Waals attraction or adhesion was evident. The absence of an attraction cannot be explained by the presence of hydration forces.© 2012, American Chemical Society
Description
Keywords
Deposition, Titanium, Van der Waals forces, Thin films, Silica, Oxides
Citation
Walsh, R. B., Nelson, A., Skinner, W. M., Parsons, D., Craig, V. S. J. (2012). Direct Measurement of van der waals and diffuse double-layer forces between titanium dioxide surfaces produced by atomic layer deposition. Journal of Physical Chemistry C, 116(14), 7838-7847. doi:10.1021/jp300533m