ANSTO Publications Online >
Journal Publications >
Journal Articles >
Please use this identifier to cite or link to this item:
|Title: ||Niobium diffusion in niobium-doped titanium dioxide.|
|Authors: ||Sheppard, LR|
|Issue Date: ||Jul-2009|
|Citation: ||Sheppard, L. R., Atanacio, A. J., Bak, T., Nowotny, J., Nowotny, M. K., & Prince, K. E. (2009). Niobium diffusion in niobium-doped titanium dioxide. Journal of Solid State Electrochemistry, 13(7), 1115-1121.|
|Abstract: ||The present work studied the self-diffusion coefficient of Nb-93 in Nb-doped TiO2 single crystal (4.3 at.% Nb) at high oxygen activity [p(O-2) = 21 kPa] over the temperature range 1,073 to 1,573 K. The diffusion-induced Nb-93 concentration profile was determined by using secondary ion mass spectrometry (SIMS). The subsequently determined self-diffusion coefficient of 93Nb exhibits the following temperature dependence: D-93Nb - 1.77 x 10(-9) m(2) s(-1) exp(-197 +/- 9 kJ mol(-1)/RT). This study builds upon a similar study performed previously for Nb-93 tracer diffusion in undoped TiO2, and identifies the effect of compositional change on self-diffusion behaviour. The obtained activation energy has been considered in terms of migration and formation enthalpies of titanium vacancies. © 2009, Springer. The original publication is available at www.springerlink.com|
|Appears in Collections:||Journal Articles|
Files in This Item:
There are no files associated with this item.
Items in APO are protected by copyright, with all rights reserved, unless otherwise indicated.