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|Title:||Model Surfaces Produced by Atomic Layer Deposition|
Temperature range 0065-0273 K
|Publisher:||The Chemical Society of Japan|
|Citation:||Walsh, R. B., Howard, S. C., Nelson, A., Skinner, W. M., Liu, G. M., & Craig, V. S. J. (2012). Model Surfaces Produced by Atomic Layer Deposition [Special Issue]. Chemistry Letters, 41(10), 1247-1249. doi:10.1246/cl.2012.1247|
|Abstract:||Atomic layer deposition is used with the aim of producing new model surfaces suitable for fundamental wet surface science investigations. Alumina surfaces are found to dissolve in aqueous solutions, although they can be passivated against dissolution by adsorption. Highly useful thick titania films can be produced by employing low temperatures during formation, whereas hafnia and zirconia films have a tendency to produce films that crystallize, and this increases the roughness of the films. © 2012, The Chemical Society of Japan.|
|Gov't Doc #:||4772|
|Appears in Collections:||Journal Articles|
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