Please use this identifier to cite or link to this item: https://apo.ansto.gov.au/dspace/handle/10238/4342
Title: Direct measurement of van der waals and diffuse double-layer forces between titanium dioxide surfaces produced by atomic layer deposition
Authors: Walsh, RB
Nelson, A
Skinner, WM
Parsons, DF
Craig, VSJ
Keywords: Deposition
Titanium
Van der waals forces
Thin films
Silica
Oxides
Issue Date: 12-Apr-2012
Publisher: American Chemical Society
Citation: Walsh, R. B., Nelson, A., Skinner, W. M., Parsons, D., Craig, V. S. J. (2012). Direct Measurement of van der waals and diffuse double-layer forces between titanium dioxide surfaces produced by atomic layer deposition. Journal of Physical Chemistry C, 116(14), 7838-7847. doi:10.1021/jp300533m
Abstract: The van der Waals forces between titanium dioxide surfaces produced by atomic layer deposition (ALD) at the isoelectric point have been measured and found to agree with the calculated interaction using Lifshitz theory. It is shown that under the right conditions very smooth ALD surfaces are produced. At pH values slightly below and above the isoelectric point, a repulsive diffuse double-layer repulsion was observed and is attributed to positive and negative charging of the surfaces, respectively. At high pH, it was found that the forces remained repulsive up until contact and no van der Waals attraction or adhesion was evident. The absence of an attraction cannot be explained by the presence of hydration forces.© 2012, American Chemical Society
Gov't Doc #: 4391
URI: http://dx.doi.org/10.1021/jp300533m
http://apo.ansto.gov.au/dspace/handle/10238/4342
ISSN: 1932-7447
Appears in Collections:Journal Articles

Files in This Item:
File Description SizeFormat 
jp300533m_si_001.pdf177.72 kBAdobe PDFThumbnail
View/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.