Browsing by Author "Rosen, J"
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- ItemInfluence of gas entry point on plasma chemistry, ion energy and deposited alumina thin films in filtered cathodic arc(Springer, 2007-07-03) Rosen, J; Persson, POA; Ionescu, M; Pigott, J; McKenzie, DR; Bilek, MMMThe effect of gas entry point on the plasma chemistry, ion energy distributions and resulting alumina thin film growth have been investigated for a d.c. cathodic arc with an aluminum cathode operated in an oxygen/argon atmosphere. Ions of aluminum, oxygen and argon, as well as ions originating from the residual gas are investigated, and measurements for gas entry at both the cathode and close to the substrate are compared. The latter was shown to result in higher ion flux, lower levels of ionised residual gas, and lower ion energies, as compared to gas inlet at the cathode. These plasma conditions that apply when gas entry at the substrate is used result in a higher film deposition rate, less residual gas incorporation, and more stoichiometric alumina films. The results show that the choice of gas entry point is a crucial parameter in thin film growth using reactive PVD processes such as reactive cathodic arc deposition. © 2007, Springer.
- ItemOxygen incorporation in Ti2AlC thin films(American Institute of Physics, 2008-02-11) Rosen, J; Persson, POA; Ionescu, M; Kondyurin, A; McKenzie, DR; Bilek, MMMThin films of Ti2AlC MAX phase have been deposited using a multiple cathode pulsed cathodic arc. Evidence for substantial oxygen incorporation in the MAX phase is presented, likely originating from residual gas present in the vacuum chamber during deposition. The characteristic MAX phase crystal structure is maintained, in agreement with ab initio calculations, supporting substitutional O in C lattice positions. On the basis of these results, we propose the existence of a MAX phase-like material with material properties tuned by the incorporation of oxygen. Additionally, possible unintentional O incorporation in previously reported MAX phase materials is suggested. © 2008, American Institute of Physics